Area-Selective Etching of Poly(methyl methacrylate) Films by
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Polymers, Free Full-Text
Effect of SIS treatment on the etch resistance of PMMA and ZEP520A. (a)
Coatings, Free Full-Text
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Left) SIS lithography using block copolymer. a) Self-assembled
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Playing with sizes and shapes of colloidal particles via dry etching methods - ScienceDirect
Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition
Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching
Nanomaterials, Free Full-Text
Directed self-assembly of PS(hv-PS′)-b-PMMA after selective UV
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control
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